Aluminum Sputtering Targets (Al)

Aluminum is a silvery-white, metallic material. It can be found in kitchen utensils, cars, street lights, and aluminum foil in food packaging. Although it is not a strong material, it is a good conductor of heat and electricity and can form an oxide layer resistant to corrosion.  If evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. The aluminum sputtering target is widely used in the aerospace, automotive lighting, OLED, and optical industries. Some high purity aluminum targets are used in the semiconductor chip, flat panel display, and solar cell industries.

Aluminum Sputtering Targets Specification

Purity: 99.99-99.9995%;
Target Type: Planar & Rotary sputtering targets
Circular: Diameter <= 16 inch, Thickness >= 1mm;
Block: Length <= 48 inch, Width <= 15.75 inch, Thickness >= 1mm.

 

Aluminum Sputtering Targets Analysis

AEM Deposition’s high purity aluminum sputtering targets make your films possess an outstanding electrical conductivity level and minimize particle formation during the PVD process. We usually use two analytical methods to test our products:
1. Metallic elements analyze using GDMS.
2. Gas elements analyze using LECO.

More Information on Aluminum Sputtering Targets

Applications
• Electronics
• Semiconductor
• Flat panel displays
Features
• Competitive pricing
• High purity
• Grain refined, Engineered microstructure
( the average grain size < 300 um)
• Semiconductor grade

 

Manufacturing Process
• Melting,  Zone melting
• Analysis  GDMS,ICP-OES
• Analysis  Casting & Grain refinement
• Cleaning and final packaging-Cleaned for use in vacuum
Protection from environmental contaminants
Protection during shipment
Options
• 99.99% minimum purity
• Aluminum alloys sputtering targets
Al2O3, Ni/Cr/Al/Si, Al/Nd, Y3Al5O12, In2O3/Al2O3/ZnO, Al/Si/Cu,
Al/Cu, CuAlO2, AlN, Ni3/Al, Fe/Al, Al/Sc
• Smaller sizes also available for R&D applications
• Sputtering target bonding service