Niobium Sputtering Target

Category:

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Material TypeZ RatioSymbolSputterAtomic WeightMax Power Density*Atomic Number(Watts/Square Inch)Color/AppearanceType of BondThermal ConductivityCommentsMelting Point (°C) Coefficient of Thermal Expansion

Niobium 0.492
Nb DC
92.90638 100
41
Gray, Metallic Indium, Elastomer
54 W/m.K Attacks W source.
2,468
7.3 x 10-6/K

Niobium Sputtering Target

Purity: Nb>99.9%, 99.95%, 99.99%, 99.995%

Standard: ASTM B393-05

Density: >8.3g/cc

Recrystallization: >95%

Surface Roughness: Ra 0.8-1.6

Flatness: 0.1mm or 0.1%

provides niobium target with uniform, high-density microstructure, and controlled texture, promoting uniform sputtering rates and generally superior sputtering behavior.

Chemical Composition of Niobium Sputtering Target

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GradeChemical Composition, MaxFeSiMoWTiCrTaNiOCHNNb+Ta≥%

Nb3 20 20 80 100 10 10 1000 20 250 100 15 150 99.9
Nb2 10 10 50 50 5 5 500 10 200 50 10 100 99.95
Nb1 5 5 10 20 1 1 100 1 100 30 10 50 99.99

Niobium Sputtering Target Specifications

We can supply 8″, 12″ niobium round shape sputtering target. The largest disc target that we can provide is with 29” diameter. Below are most of the standard sizes for our tantalum rectangle sputtering targets. If you do not see the size that you need, please feel free to contact us.

Sizes/Tolerance(mm.max)

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ThicknessToleranceWidthToleranceLengthToleranceGradeⅠGradeⅡ

3-8 ±0.1 ±0.2 50-400 ±0.2 50-1800 ±0.2
8-14 ±0.1 ±0.2 50-350 ±0.2 50-1500 ±0.2
≥14 ±0.1 ±0.2 50-300 ±0.2 50-1200 ±0.2

Sizes/Tolerance(mm.max)

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Thickness Tolerance Diameter Diameter Tolerance
GradeⅠ GradeⅡ
3-8 ±0.1 ±0.2 50-450 ±0.2
8-14 ±0.1 ±0.2 50-450 ±0.2
≥14 ±0.1 ±0.2 50-400 ±0.2

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