[vc_row][vc_column][vc_column_text]
Tantalum Oxide Powder
Due to its high refractive index, Ta2O5 has been utilized to produce the glass of photographic lenses.[/vc_column_text][vc_empty_space][/vc_column][/vc_row][vc_row][vc_column][vc_column_text css=””]
Evaporation Parameters:
| Evaporation Temperature | ~2000° C |
|---|---|
| Source Container | Tantalum or graphite liner for E-beam |
| Rate | 2-5 Å/sec. |
| Partial Pressure of Oxygen | ~1 x 10-4 Torr |
| Substrate Temperature | 175° C to300° C. |
| Z-Ratio | 0.3 |
[/vc_column_text][vc_empty_space height=”64px”][vc_empty_space][/vc_column][/vc_row][vc_row][vc_column][vc_empty_space][vc_empty_space][vc_column_text css=””]
Physical Properties of Solid Material:
| Molecular Weight | 441.89 g/mol |
|---|---|
| Melting Point | 1872° C |
| Color | White or black |
| Crystal Density | 8.2g/cc |
[/vc_column_text][/vc_column][/vc_row][vc_row][vc_column][vc_empty_space][vc_empty_space][vc_column_text css=””]
Compositions of Tantalum Oxide Powder
| Grade | Ta2O5-1 | Ta2O5-2 | Ta2O5-3 | |
|---|---|---|---|---|
| Ta2O5 (metal basis) | >99.9% | >99.99% | >99.999% | |
| F.S.S.S | 0.5~2um | 1~3um | 1~3um | |
| Impurities | Nb | <0.005% | <10ppm | <2ppm |
| Fe | <0.005% | <10ppm | <3ppm | |
| Si | <0.002% | <10ppm | <3ppm | |
| Ti | <0.002% | <3ppm | <1ppm | |
| Ni | <0.002% | <3ppm | <1ppm | |
| W | <0.003% | <5ppm | <2ppm | |
[/vc_column_text][/vc_column][/vc_row][vc_row][vc_column][vc_empty_space][vc_column_text css=””]
Tantalum Oxide Powder Applications
Tantalum oxide is intermixed with silicon in gate dielectric structures. It may be used to synthesize hexagonally packed mesoporous tantalum oxide molecular sieves. Ion-beam sputter deposition of tantalum oxide films is investigated for possible optical coating applications. It may be used in making optical glass for lenses and in electronic circuits.[/vc_column_text][/vc_column][/vc_row]



